Ion beamAn ion beam is a type of charged particle beam consisting of ions. Ion beams have many uses in electronics manufacturing (principally ion implantation) and other industries. A variety of ion beam sources exists, some derived from the mercury vapor thrusters developed by NASA in the 1960s. The most common ion beams are of singly-charged ions. Ion current density is typically measured in mA/cm^2, and ion energy in eV.
Ion sourceAn ion source is a device that creates atomic and molecular ions. Ion sources are used to form ions for mass spectrometers, optical emission spectrometers, particle accelerators, ion implanters and ion engines. Electron ionization Electron ionization is widely used in mass spectrometry, particularly for organic molecules. The gas phase reaction producing electron ionization is M{} + e^- -> M^{+\bullet}{} + 2e^- where M is the atom or molecule being ionized, e^- is the electron, and M^{+\bullet} is the resulting ion.
Implantation ioniqueL'implantation ionique est un procédé d'ingénierie des matériaux. Comme son nom l'indique, il est utilisé pour implanter les ions d'un matériau dans un autre solide, changeant de ce fait les propriétés physiques de ce solide. L'implantation ionique est utilisée dans la fabrication des dispositifs à semi-conducteurs, pour le traitement de surface des métaux, ainsi que pour la recherche en science des matériaux. Les ions permettent à la fois de changer les propriétés chimiques de la cible, mais également les propriétés structurelles car la structure cristalline de la cible peut être abîmée ou même détruite.
Spectrométrie de masse des ions secondairesLa spectrométrie de masse des ions secondaires est un procédé d'analyse de surface connu sous le nom de SIMS, d'après l'acronyme anglais signifiant secondary ion mass spectrometry, qui consiste à bombarder la surface de l'échantillon à analyser avec un faisceau d'ions. L'échantillon est alors pulvérisé, et une partie de la matière pulvérisée est ionisée. Ces ions secondaires sont alors accélérés vers un spectromètre de masse qui permettra de mesurer la composition élémentaire, isotopique ou moléculaire de la surface de l'échantillon.
Neutral-beam injectionNeutral-beam injection (NBI) is one method used to heat plasma inside a fusion device consisting in a beam of high-energy neutral particles that can enter the magnetic confinement field. When these neutral particles are ionized by collision with the plasma particles, they are kept in the plasma by the confining magnetic field and can transfer most of their energy by further collisions with the plasma. By tangential injection in the torus, neutral beams also provide momentum to the plasma and current drive, one essential feature for long pulses of burning plasmas.
Sonde ionique focaliséeLa sonde ionique focalisée, plus connue sous le nom du sigle anglais FIB (Focused ion beam), est un instrument scientifique qui ressemble au microscope électronique à balayage (MEB). Mais là où le MEB utilise un faisceau d'électrons focalisés pour faire l'image d'un échantillon, la "FIB" utilise un faisceau d'ions focalisés, généralement du gallium. Il est en effet facile de construire une source à métal liquide (LMIS, de l'anglais liquid metal ion source). Contrairement aux MEB, les FIB sont destructives.
Superconducting quantum computingSuperconducting quantum computing is a branch of solid state quantum computing that implements superconducting electronic circuits using superconducting qubits as artificial atoms, or quantum dots. For superconducting qubits, the two logic states are the ground state and the excited state, denoted respectively. Research in superconducting quantum computing is conducted by companies such as Google, IBM, IMEC, BBN Technologies, Rigetti, and Intel. Many recently developed QPUs (quantum processing units, or quantum chips) utilize superconducting architecture.
Sputter depositionSputter deposition is a physical vapor deposition (PVD) method of thin film deposition by the phenomenon of sputtering. This involves ejecting material from a "target" that is a source onto a "substrate" such as a silicon wafer. Resputtering is re-emission of the deposited material during the deposition process by ion or atom bombardment. Sputtered atoms ejected from the target have a wide energy distribution, typically up to tens of eV (100,000 K).
Cible (marketing)A target market, also known as serviceable obtainable market (SOM), is a group of customers within a business's serviceable available market at which a business aims its marketing efforts and resources. A target market is a subset of the total market for a product or service. The target market typically consists of consumers who exhibit similar characteristics (such as age, location, income or lifestyle) and are considered most likely to buy a business's market offerings or are likely to be the most profitable segments for the business to service by OCHOM Once the target market(s) have been identified, the business will normally tailor the marketing mix (4 Ps) with the needs and expectations of the target in mind.
Target audienceA target audience is the intended audience or readership of a publication, advertisement, or other message catered specifically to said intended audience. In marketing and advertising, it is a particular group of consumer within the predetermined target market, identified as the targets or recipients for a particular advertisement or message. Businesses that have a wide target market will focus on a specific target audience for certain messages to send, such as The Body Shops Mother's Day advertisements, which were aimed at the children and spouses of women, rather than the whole market which would have included the women themselves.
