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Multimaterial Nanoporous Membranes Shaped through High Aspect-Ratio Sacrificial Silicon Nanostructures

Publications associées (35)

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Spontaneous formation of ordered micro-wrinkles on a thermosensitive resist

Jürgen Brugger, Giovanni Boero, Xia Liu, Ana Conde Rubio, Mohammadreza Rostami

Self-organizing patterns with micrometer-scale features are promising for applications in photonics and bioengineering. Their spontaneous formation reduces the number of required processing steps. Here, we report an approach to spontaneously form stochasti ...

2021

Mesoscopic magnetic systems: From fundamental properties to devices

Dirk Grundler

Research into mesoscopic magnetic systems, which incorporate magnetic elements with dimensions ranging from a few nm up to a few 10s of micrometer, has been spurred on by the developments in their fabrication, characterisation, and control. Electron beam a ...

2021

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Atomically thin materials, such as graphene and transition metal dichalcogenides, are promising candidates for future applications in micro/nanodevices and systems. For most applications, functional nanostructures have to be patterned by lithography. Devel ...

2020

Sub-20nm gaps in HSQ for ultra-scaled nanoelectronic devices

Maneesha Rupakula, Wolfgang Amadeus Vitale

We build sub-20 nm gaps in hydrogen silsesquioxane (HSQ) by electron beam lithography, to enable nano-template structures for selective epitaxial growth of Ge or III-V semiconductors for ultra-scaled electronic applications [1]. Gaps of this order have bee ...

2016

Precision glass molding of high-resolution diffractive optical elements

Hans Peter Herzig, Toralf Scharf, Karin Prater

The demand of high resolution diffractive optical elements (DOE) is growing. Smaller critical dimensions allow higher deflection angles and can fulfill more demanding requirements, which can only be met by using electron-beam lithography. Replication techn ...

Spie-Int Soc Optical Engineering2016

Top-Down Fabrication of Silicon Nanowires in Ultra-deep Trenches

Georg Fantner, Davide Sacchetto, Yusuf Leblebici, Oliver Peric, Zuhal Tasdemir

One-Dimensional (1D) nanostructures have gained a considerable attention in the field of semiconductor technology for the past several decades. With the help of rapid development in the process technology, it becomes possible to scale these nanostructures ...

2014

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A new and versatile fabrication process of insulated gold tip probes for atomic force microscopy (AFM) is presented by Wu et al. (In-plane fabricated insulated gold-tip probe for electrochemical and molecular experiments, in: 2013 IEEE 26th International C ...

Elsevier2014

Shaping intensity behind amplitude masks for proximity correction lithography: Design, measurement and realization

Hans Peter Herzig, Toralf Scharf, Qing Tan, David Nguyen, Krishnaparvathy Puthankovilakam

Proximity exposure techniques in lithography are getting more and more popular because of the cost of ownership advantage of mask aligners compared to projection systems. In this paper a gap between simulation and the final result, the prints will be close ...

Spie-Int Soc Optical Engineering2014

The application of Au/Si3N4 stencil masks for the transfer of patterns using different MeV-ion beams with various substrates has been investigated. The techniques investigated were namely, conventional lithography with positive- and negative-tone resist po ...

Elsevier2013

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In this contribution we present a scanning probe with a gold-tip completely encapsulated with insulator all the way to the apex. The probe fabrication is unique owing to an in-plane arrangement in which the width of the cantilever is defined by deep reacti ...

IEEE2013