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In this note, we demonstrate the high-temperature growth of GaN on ScAlMgO4 substrates by metalorganic vapor phase epitaxy when a thin Al film is deposited ex situ on the ScAlMgO4 surface, prior to GaN growth. Mirror-like high-quality GaN epitaxial layers were obtained when N-2 was used as carrier gas during the reactor temperature ramp-up preceding GaN growth, leading to a higher GaN quality compared to direct growth on ScAlMgO4 using a trimethylaluminium preflow. This opens a pathway for high-temperature GaN growth on ScAlMgO4 when an Al precursor line is not present.
Raffaella Buonsanti, Anna Loiudice, Pascal Alexander Schouwink, Krishna Kumar, Coline Marie Agathe Boulanger, Valery Okatenko, Alexander Nicolas Chen
Elison de Nazareth Matioli, Alessandro Floriduz
Elison de Nazareth Matioli, Remco Franciscus Peter van Erp, Alessandro Floriduz, Pirouz Sohi, Luca Nela, Riyaz Mohammed Abdul Khadar, Catherine Erine, Taifang Wang