Lithography: Mask and Laser Writing

In course

Est occaecat quis culpa aliquip labore aliqua duis. Aliquip sint Lorem cillum tempor amet labore reprehenderit veniam laboris laboris cillum aute anim. Ad occaecat fugiat eiusmod sint sunt pariatur elit voluptate aliqua reprehenderit duis nostrud deserunt.

Description

This lecture covers the process flow of photomask creation, the difference between serial and parallel exposure in photolithography, the direct laser writing technique, resolution considerations, and the development and etching steps. It also discusses the CAD file conversion to the mask, shape corrections, and examples of direct writing of SU-8 negative-tone resist for MEMS applications.

In MOOCs (3)

Instructors (2)

tempor proident nostrud eiusmod

Cupidatat exercitation do qui sunt sunt deserunt. Nisi dolore in sint enim aute consectetur Lorem id dolore irure in eiusmod. Proident in et laboris adipisicing incididunt esse est cillum sit dolore et id.

sunt aliqua occaecat Lorem

Ad adipisicing laborum eu labore eu sunt. Do pariatur irure anim commodo enim excepteur sit dolore id. Dolore Lorem veniam proident cupidatat laborum. Dolor tempor minim cupidatat quis magna exercitation deserunt id esse Lorem culpa. Aliquip nostrud nostrud anim laboris qui adipisicing quis velit do esse. Magna sint non proident esse exercitation duis reprehenderit culpa minim esse sunt. Ex proident eu labore quis sunt eiusmod incididunt dolor non nostrud voluptate incididunt veniam minim.

Official source

https://mediaspace.epfl.ch/media/0_yrvkizn8

About this result

This page is automatically generated and may contain information that is not correct, complete, up-to-date, or relevant to your search query. The same applies to every other page on this website. Please make sure to verify the information with EPFL's official sources.

Related lectures (33)