Publications related to Photolithography

Localized Ion Implantation Through Micro/Nanostencil Masks

Jürgen Brugger, Luis Guillermo Villanueva Torrijo, Cristina Martin Olmos, Philippe Langlet, Oscar Vazquez Mena

A method is presented that allows the deﬁnition of micrometer- and submicrometer-sized implanted structures in silicon without using photoresist patterning. The process is based on the use of stencils as masks in a conventional ion implanter, and is tested ...

Institute of Electrical and Electronics Engineers2011

Photopatterning the mechanical properties of polydimethylsiloxane films

Stéphanie Lacour

Silicone rubber films with graded and localized mechanical properties are prepared using two-part polydimethylsiloxane (PDMS) elastomer, photoinhibitor compounds and conventional photolithography. First the un-cross-linked PDMS is mixed with benzophenone. ...

American Institute of Physics2011

SiN membranes with submicrometer hole arrays patterned by wafer-scale nanosphere lithography

Jürgen Brugger, Andreea Veronica Savu, Nicolas Blondiaux, Oscar Vazquez Mena, Harry Heinzelmann, Mona Julia Katharina Klein, Raphaël Pugin, Franck Montagne

In this work, nanosphere lithography was integrated with standard microfabrication for the wafer-scale fabrication of silicon nitride (SiN) membranes with arrays of submicrometer holes. A monolayer of polystyrene (PS) beads with a mean diameter of 428 or 5 ...

2011

SiN membranes with submicrometer hole arrays patterned by wafer-scale nanosphere lithography

Jürgen Brugger, Andreea Veronica Savu, Nicolas Blondiaux, Oscar Vazquez Mena, Harry Heinzelmann, Mona Julia Katharina Klein, Raphaël Pugin, Franck Montagne

2011

Optical Properties of UT-Shaped Plasmonic Nanoaperture Antennas

Hatice Altug, Arif Engin Cetin, Serap Aksu

In this paper, we present numerical and experimental results on optical properties of a multi-resonant UT-shaped plasmonic nanoaperture antenna for enhanced optical transmission and near-field resolution. We propose different structure designs in order to ...

SPIE-INT SOC OPTICAL ENGINEERING2011

Pattern transfer and post processing of complex nanostructures formed by e-beam exposure in PMMA

Nico de Rooij, Sebastian Gautsch

We present results on various post processing techniques to create complex 3-dimensional nanostructures with enhanced capabilities. The starting point for all architectures is a self aligned nanopillar with surrounding circular rim in PMMA. This particular ...

Elsevier2011

U-Shaped Nano-Apertures for Enhanced Optical Transmission and Resolution

Hatice Altug, Arif Engin Cetin, Serap Aksu

The subject of light transmission through optically thin metal films perforated with arrays of subwavelength nanoholes has recently attracted significant attention. In this work, we present experimental and calculated results on optical transmission/reflec ...

SPIE-INT SOC OPTICAL ENGINEERING2011

Towards fabrication of Vertical Slit Field Effect Transistor (VeSFET) as new device for nano-scale CMOS technology

Jean-Michel Sallese, Didier Bouvet, Lucian Barbut

This paper proposes a CMOS based process for Vertical Slit Field Effect Transistors. The central part of the device, namely, the vertical slit, is defined by using electron beam lithography and silicon dry etching. In order to verify the validity and the r ...

IEEE2011

Sub-micron channels fabricated by direct electron beam lithography on SU8 for optofluidic bacterial analysis

Demetri Psaltis, Andreas Vasdekis

Microfluidic structures in poly(dimethylsiloxane) (PDMS) are usually fabricated by optically patterning a resist and subsequently transferring this pattern to PDMS. Such microsystems suffer from reduced resolution, which in turn inhibit the manipulation of ...

Spie-Int Soc Optical Engineering, Po Box 10, Bellingham, Wa 98227-0010 Usa2011

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Photolithography

Localized Ion Implantation Through Micro/Nanostencil Masks

Photopatterning the mechanical properties of polydimethylsiloxane films

SiN membranes with submicrometer hole arrays patterned by wafer-scale nanosphere lithography

SiN membranes with submicrometer hole arrays patterned by wafer-scale nanosphere lithography

Optical Properties of UT-Shaped Plasmonic Nanoaperture Antennas

Self Aligned Concentric Nanostructures Formed by E-beam Overexposure of PMMA and Single Post Processing Steps

Pattern transfer and post processing of complex nanostructures formed by e-beam exposure in PMMA

U-Shaped Nano-Apertures for Enhanced Optical Transmission and Resolution

Towards fabrication of Vertical Slit Field Effect Transistor (VeSFET) as new device for nano-scale CMOS technology

Sub-micron channels fabricated by direct electron beam lithography on SU8 for optofluidic bacterial analysis

Graph Chatbot

Chat with Graph Search

Photopatterning the mechanical properties of polydimethylsiloxane films

SiN membranes with submicrometer hole arrays patterned by wafer-scale nanosphere lithography

Optical Properties of UT-Shaped Plasmonic Nanoaperture Antennas

U-Shaped Nano-Apertures for Enhanced Optical Transmission and Resolution

Sub-micron channels fabricated by direct electron beam lithography on SU8 for optofluidic bacterial analysis

Pattern transfer and post processing of complex nanostructures formed by e-beam exposure in PMMA

SiN membranes with submicrometer hole arrays patterned by wafer-scale nanosphere lithography

Localized Ion Implantation Through Micro/Nanostencil Masks

Self Aligned Concentric Nanostructures Formed by E-beam Overexposure of PMMA and Single Post Processing Steps

Towards fabrication of Vertical Slit Field Effect Transistor (VeSFET) as new device for nano-scale CMOS technology