Plasma-enhanced chemical vapor deposition

Applied sciences
Chemical engineering
Materials science
Thin film

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FIB Applications: Nanofabrication and Failure Analysis

Explores Focused Ion Beam (FIB) applications in nanofabrication and failure analysis.

Chemical Vapor Deposition: Processes and Applications

Explores various Chemical Vapor Deposition processes, including APCVD, SACVD, LPCVD, UHV/CVD, PECVD, and MOCVD, focusing on film growth and plasma effects.

Thin-Film Processing: Removal and Deposition

Explores thin-film removal and deposition techniques in CMOS technology, covering wet etching, dry etching, chemical mechanical polishing, and thin-film deposition methods.

Chemical Vapour Deposition: Micro and Nanofabrication

Explores Chemical Vapour Deposition for micro and nanofabrication processes.

Transparent Conductive Oxides

Explores the evolution, properties, and applications of Transparent Conductive Oxides, including challenges in optoelectronic applications and strategies for reducing surface reflections in solar cells.

Ceramic Processing: Powders & Pieces

Explores ceramic pieces, powders, forming methods, thin films, and surfactants.

Catalyst Synthesis II: Deposition and Precipitation

Explores catalyst synthesis through deposition and precipitation, covering principles, applications, (co-)precipitation, zeolites, carbon supports, and perovskites.

Thin-Film Processing: Deposition Techniques

Explores thin-film processing techniques, focusing on chemical vapor deposition advantages, growth modes, ALD, plasma role, and discharge initiation.

Chemical Vapor Deposition: Si, SiN4, SiO2, Diamond

Explores LPCVD and PECVD processes for Si, SiN4, SiO2, and diamond in microelectronics applications.

Sputtering: Ion Target Interactions

Examines ion-target interactions in PVD sputtering processes, covering compound deposition, surface damage, and factors influencing target ejection rates.