Lecture
This lecture covers the process of deposition, which involves growing a thin film of material onto a substrate using various techniques. It explains thermal oxidation for growing SiO2 on Si substrates, emphasizing the key parameters like temperature and time. The lecture also delves into chemical vapor deposition (CVD), detailing how material is deposited on a substrate through chemical reactions between gases or reagents and the surface. Different types of CVD techniques are discussed, including PECVD, which is a modern method suitable for substrates that cannot withstand high temperatures.