Focused Beam Lithography: E-Beam Basics

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Explores lithography methods for defining patterns in micro/nano fabrication and discusses the importance and steps involved in the process.

SEM Basics: Introduction to Electron Microscopy

Introduces the basics of scanning electron microscopy, covering electron sources, lenses, vacuum system, and detectors.

Aberration Correction in HRTEM

Explains the principles of HRTEM, including contrast transfer, lenses, and aberration correction.

TEM Components and Operation

Explores the components and operation of a Transmission Electron Microscope (TEM), including vacuum systems, electron sources, lenses, aberrations, and detectors.

Nanoimprint Lithography: Basics and Applications

Covers the basics of nanoimprint lithography and its applications in high-end microelectronic chips.

Thermal Scanning Probe Lithography

Explores Thermal Scanning Probe Lithography, Dip-Pen Nanolithography, surface wettability, data storage roadmap, and the Millipede concept.

Lithography: Fabrication Extended

Covers main issues in lithography fabrication, exposure considerations, development challenges, and resolution limits.

Lithography: Fabrication Extended

Explores lithography techniques in nanofabrication, focusing on EBL and NIL processes.

High Resolution TEM: Imaging and Contrast

Explores High Resolution TEM principles for atomic-level crystal imaging.

Transmission electron microscopy: History and Aberration Correction

Explores the history of Transmission Electron Microscopy and the advancements in aberration correction techniques, discussing various contrasts in TEM imaging.