Sputtering: Plasma Formation and Thin Film Deposition

This lecture introduces sputtering as a physical vapor deposition technique, explaining how a plasma is created, the different plasma zones in the sputter chamber, and the process optimization. It details the ion bombardment mechanism to remove material from a target and deposit it on a substrate, showcasing the steps involved in creating a plasma and depositing thin films of various materials. The lecture also covers the principles of plasma, its role in sputtering, and the transition from a dark discharge to a glow discharge, essential for microfabrication applications.