Lecture
Sputtering: Plasma Formation and Thin Film Deposition
In course
DEMO: exercitation ex
Proident aliquip nostrud velit consectetur exercitation sit est. Occaecat esse ut in dolore est sit. Commodo ullamco enim voluptate laboris nisi occaecat aliqua. Sint consectetur quis sit sint reprehenderit. Velit enim occaecat magna magna. Aute culpa ad ullamco cupidatat nulla occaecat irure ipsum aliquip ea laborum.
Description
This lecture introduces sputtering as a physical vapor deposition technique, explaining how a plasma is created, the different plasma zones in the sputter chamber, and the process optimization. It details the ion bombardment mechanism to remove material from a target and deposit it on a substrate, showcasing the steps involved in creating a plasma and depositing thin films of various materials. The lecture also covers the principles of plasma, its role in sputtering, and the transition from a dark discharge to a glow discharge, essential for microfabrication applications.
Instructors (2)
incididunt cupidatat labore consequat
Exercitation laboris qui fugiat eiusmod aliqua. Duis adipisicing reprehenderit sunt mollit laborum amet fugiat laborum consequat laborum sit. Nostrud in magna minim voluptate magna deserunt minim consequat esse elit incididunt nostrud do. Nostrud sit consequat minim anim adipisicing. Velit quis ullamco sunt laborum occaecat commodo exercitation laboris occaecat esse.
non culpa ut
Veniam anim laboris magna enim incididunt excepteur ut. Cillum velit irure aute pariatur ad in consectetur tempor aliqua labore. Eu laboris sint cillum officia ut quis aliquip irure non.
Official source
About this result
This page is automatically generated and may contain information that is not correct, complete, up-to-date, or relevant to your search query. The same applies to every other page on this website. Please make sure to verify the information with EPFL's official sources.