Doping (semiconductor) | EPFL Graph Search

In semiconductor production, doping is the intentional introduction of impurities into an intrinsic semiconductor for the purpose of modulating its electrical, optical and structural properties. The doped material is referred to as an extrinsic semiconductor. Small numbers of dopant atoms can change the ability of a semiconductor to conduct electricity. When on the order of one dopant atom is added per 100 million atoms, the doping is said to be low or light. When many more dopant atoms are added, on the order of one per ten thousand atoms, the doping is referred to as high or heavy. This is often shown as n+ for n-type doping or p+ for p-type doping. (See the article on semiconductors for a more detailed description of the doping mechanism.) A semiconductor doped to such high levels that it acts more like a conductor than a semiconductor is referred to as a degenerate semiconductor. A semiconductor can be considered i-type semiconductor if it has been doped in equal quantities of

Dynamics of Electronic and Ionic Charges in Cyanine Organic Semiconductor Devices

Sandra Christina Jenatsch

Organic semiconductor materials have been widely applied in optoelectronic devices to replace their inorganic counterparts and explore new fields of applications. Due to their high extinction coefficients, chemical tunability and solubility, cyanine dyes are an interesting class of molecules to be employed in organic semiconductor devices. Their beneficial properties have been demonstrated in organic solar cells (OSC), photodetectors and recently in organic light-emitting electrochemical cells (OLEC). The focus of this thesis is to analyse different aspects regarding the dynamics of electronic and ionic charges in cyanine based devices. Models and conclusions are not restricted to cyanine based devices but can potentially be applied in various systems where combined ionic and electronic charges are present. In order to focus on electronic processes in OSCs, a combination of steady-state, transient and impedance analysis is used. It is resolved that trapped charges can be introduced at the dye/hole extracting layer interface by using specific solvents for the cyanine layer fabrication. These measurements also reveal the low hole mobility of cyanine films which in turn limits the possible upper layer thickness in OSCs. A frequently used way to enhance the conductivity of organic semiconductors is the addition of extra charges by chemical doping. This concept is employed for a near-infrared absorbing dye which is used as donor in a bilayer solar cell. The dependence of all figures of merit versus doping concentration and layer thickness is studied in detail. It is found that the performance of the optimised cell is not further improved by doping, but that it presents a good option if thicker layers are required, e.g. on rough substrates. Furthermore, the stability and degradation pathway of the p-doped species is analysed. This information is of general relevance as they also occur after charge transfer at the heterojunction interface of an OSC and during operation of OLECs. The dynamics of ionic charge carriers is separated into two contributions. In a first step, the steady-state diffusion profile of the counter ion within a cyanine/fullerene bilayer structure is scrutinised using different profiling techniques. An unexpected constant ion profile is found throughout the C60 layer. Simultaneously, the potential within the acceptor is measured by the Kelvin probe technique. A mechanism of combined electron and ion transfer from the C60 to the dye and vice versa is proposed which is in agreement with the experimental results. A prerequisite for OLEC operation is the mobility of ionic charge carriers. Their dynamics in cyanine salts under the effect of an external field is therefore studied in such devices. Several methods are developed and applied to characterise the dynamic p-i-n structure in detail, i.e. the position and width of the intrinsic region as well as the doping concentrations in p- and n-doped regions. The combination of all these methods helps to understand the transient behaviour of these cyanine devices but can also be adapted to other OLEC systems. A major drawback of cyanine dyes as emissive material is their low fluorescence quantum yield in solid films. To overcome this restriction and improve the OLEC efficiency, host-guest systems with various visibly emitting dyes are studied. The gain in fluorescence quantum yield in the film can directly be transferred to an increase in external quantum efficiency of the device.

EPFL2017

From All-Si Nanowire TFETs Towards III-V TFETs

Hesham Ghoneim

Performance improvement by device scaling has been the prevailing method in the semiconductor industry over the past four decades. However, current silicon transistor technology is approaching a fundamental limit where scaling does not improve device performance. As the density of number of devices increases a rise in dynamic and especially static power dissipation is ever more present, making this the biggest issue in microelectronics today. Planar silicon devices are therefore already being replaced by multiple-gate architectures and will be replaced by new channel materials and new switching mechanisms during the next 10 years. A means to decrease the threshold and supply voltage and, therefore minimizing power dissipation, is to employ devices which exhibit a steeper slope than the MOSFET limit of 60 mV/dec at room temperature. The Tunnel FET promises steep turn-on characteristics and low leakage currents as compared to MOSFETs which make it attractive for low-power operation. A great deal of work over the past years has been done to boost device performance of Tunnel FETs by combining ultimate wrap-gate architectures, incorporation of III/V materials and band engineering for hetero-tunnel junctions. The latter is seen as an ideal route towards achieving high drive currents and steep sub-threshold slopes at low supply voltages. This thesis investigates both Si Tunnel FETs and the route towards heterostructure Tunnel FETs, but also the technological challenges to achieve these device structures. The first part of this work deals with vapor-liquid-solid grown silicon in-situ doped n+-i-p nanowire Tunnel FETs in a lateral geometry, where the influence of the gate dielectric, i.e., SiO2 or HfO2, on device performance is investigated along with the study of low-temperature behavior. The devices having the strongest gate coupling due to the high-κ gate oxide HfO2 are shown to exhibit the best device performance as compared with the SiO2 gate stack. A vertical process for Si FETs is developed and improved to obtain a fully wrap-gate geometry. It is adaptable to different material systems and is the basis for the ongoing work on InAs-on-Si nanowire Tunnel FETs. Improved performance for these heterostructure devices requires in particular high doping concentrations as well as abrupt doping profiles to achieve high tunnel currents. Therefore, the second part focuses on the InAs material system and specifically the study of dopant incorporation. Doping is done in-situ using different precursors during growth. The InAs nanowires are grown in SiO2 mask openings on 〈111〉 Si substrates in a metal-organic vapor phase epitaxy process. The effect of the dopants and growth parameters on radial and vertical growth rates, wire morphology and resistivity is investigated. A method utilizing the measured Seebeck coefficient of the InAs nanowires to extract doping densities without the need of assuming a mobility value is presented. Two other reference methods where I-V characteristics of homo-and heterojunction InAs tunnel diodes are fitted by TCAD simulations confirm this approach. Doping densities ranging from 1·1017 cm−3 to 7.1·1019 cm−3 were achieved which is comparable to the highest doping concentration reported in bulk InAs. Furthermore, single vertical pn+-junctions are fabricated by growing n-type InAs nanowires on p-type InAs substrates, which show high tunnel current densities of 500 kA/cm2 at 0.3 V reverse bias. In the forward direction, negative differential resistance is obtained below 200 K, which is the characteristic feature of an Esaki diode.

EPFL2012

Free carriers in nanocrystalline titanium dioxide thin films

Simon Springer

This thesis analyzes the properties of heavily doped nanocrystalline titanium dioxide. Thin films were deposited by magnetron sputtering with either water vapor as reactive gas or a periodically interrupted oxygen supply. The samples were at the same time electrically conducting and transparent. They consisted of mixtures of rutile, anatase and amorphous phases. Titanium dioxide is chemically stable, hard, non-toxic, transparent, and inexpensive. Due to a high refractive index it is often found in optical applications as a thin film coating. For many purposes it is interesting to take advantage of a combination of good transparency and electrical conductivity. An even larger field of applications would open if the electric conductivity of TiO2 could be increased in a controlled manner. Conventional bulk doping is limited, however, by low solubility limits. Highly conducting nanocrystalline TiO2 thin films have been obtained recently by sputtering in presence of water vapor. The present project intends to elucidate the doping mechanisms at work in such films. In addition, an alternative process to achieve grain-boundary doping of TiO2 was explored. Spectrophotometry over a wide spectral range (0.05 to 5 eV) was the main tool in probing the mobile electrical charge carriers. The interpretation of these optical measurements required appropriate models. The models developed took many structural properties into account, such as thickness, surface roughness, density, anisotropy and crystalline phase composition. The phase and morphology of the films were analyzed by X-ray diffraction and reflection, scanning probe microscopy, and electron microscopy. The chemical analyses included electron-probe microanalyses, Rutherford backscattering and elastic recoil detection analysis. The DC electrical properties were measured between room temperature and 250 °C. Most water-deposited samples showed semiconducting behavior with an activation energy of the order of 100 meV. The optical measurements revealed a broad absorption band around 1 eV. The absorption coefficient scaled with conductivity. It was successfully modelled as a Lorentzian. Similar absorption bands have been reported for reduced rutile and anatase single crystals. Water-deposited samples containing anatase exhibited a metallic behavior. In these samples the thermal activation energy was reduced to about 30 meV and the charge carriers displayed a high mobility (3 cm2V-1s-1). The infrared absorption band was about 10 times less important than in the samples devoid of anatase. Thin films of TiO2 intercalated with the equivalent of nanometer-thick layers of Ti were prepared. By changing the period in the oxygen supply the grain size, and thereby the film properties, could be modified. The films obtained in this way had many properties in common with water-deposited films. They showed the same absorption band in the infrared, had comparable charge carrier densities and were electrically conductive (102 to 104 Sm-1 at room temperature). To our knowledge, this was the first time that such high electrical conductivities were achieved by sputtering in an oxygen plasma.

EPFL2004