Micro and Nanofabrication: Basics and Techniques

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Related lectures (32)

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Lithography: Resist Properties and Exposure Methods

Covers lithography concepts, resist properties, exposure methods, and pattern transfer techniques.

Sputtering: Plasma Formation and Thin Film Deposition

Covers sputtering, plasma creation, and thin film deposition processes.

Nanoimprint Lithography: Basics and Applications

Covers the basics of nanoimprint lithography and its applications in high-end microelectronic chips.

Nanoimprint Lithography: Emerging Nanopatterning Methods

Explores lithography basics, emerging nanopatterning methods, and applications in high-end microelectronic chips.

Interferometers: Applications and Lithography

Explores interferometers' applications, lithography techniques, and nanostructure creation using interference lithography and EUV interference lithography.

Physical Vapor Deposition: Basics and Applications

Explores Physical Vapor Deposition techniques, including vapor creation and flux towards the substrate in micro and nanofabrication.

Lithography: Fabrication Extended

Explores lithography techniques in nanofabrication, focusing on EBL and NIL processes.

Thermo-mechanical Micro-actuator: Case Study

Explores the design and fabrication of a bi-morph micro-actuator and its thermo-mechanical characterization through DC and AC current applications.

Sputtering in CMi

Covers the operation of a cluster sputtering tool and the process of changing sputter targets.

Thin-Film Processing: Removal and Deposition

Explores thin-film removal and deposition techniques in CMOS technology, covering wet etching, dry etching, chemical mechanical polishing, and thin-film deposition methods.